Photocatalytically-activated self-cleaning article and method of making same

ABSTRACT

A method and article are disclosed wherein a substrate is provided with a photocatalytically-activated self-cleaning surface by forming a photocatalytically-activated self-cleaning coating on the substrate by spray pyrolysis chemical vapor deposition or magnetron sputter vacuum deposition. The coating has a thickness of at least about 500 Angstroms to limit sodium-ion poisoning to a portion of the coating facing the substrate. Alternatively, a sodium ion diffusion barrier layer is deposited over the substrate prior to the deposition of the photocatalytically-activated self-cleaning coating to prevent sodium ion poisoning of the photocatalytically-activated self-cleaning coating. The substrate includes glass substrates, including glass sheet and continuous float glass ribbon.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a divisional of U.S. Non-provisional patentapplication Ser. No. 10/075,316 filed Feb. 14, 2002, now U.S. Pat. No.6,722,159, which is a divisional of U.S. Non-provisional patentapplication Ser. No. 09/282,943 filed Apr. 1, 1999, now U.S. Pat. No.6,413,581 B1, which is a divisional of U.S. Non-provisional patentapplication Ser. No. 08/899,257 filed Jul. 23, 1997, now U.S. Pat. No.6,027,766, which claims the benefit of U.S. Provisional Application Ser.No. 60/040,566 filed Mar. 14, 1997. U.S. Provisional Application Ser.No. 60/040,565 filed Mar. 14, 1997, and U.S. Non-provisional patentapplication Ser. No. 08/899,265 to Greenberg et al., entitled“Photocatalytically-Activated Self-Cleaning Appliances”, filed Jul. 23,1997, now U.S. Pat. No. 6,054,227 are also related to the presentapplication and are hereby incorporated by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a method of depositing aphotocatalytically-activated self-cleaning coating on a substrate (e.g.glass sheet or a continuous glass float ribbon), to a method ofpreventing sodium ion poisoning of the photocatalytically-activated selfcleaning coating deposited over a sodium ion containing substrate and toarticles of manufacture prepared according to the methods.

2. Description of the Related Art

For many substrates (e.g. glass substrates), it is desirable that thesurface of the substrate remain “clean,” that is to say free of surfacecontaminants, e.g. common organic and inorganic surface contaminants.Traditionally, this has meant that such surfaces must be cleanedfrequently. This cleaning operation is typically performed manually orby mechanical devices. Either approach is quite labor, time and/or costintensive. A need exists for substrates having surfaces that areself-cleaning or at least easier to clean, which would eliminate orreduce the need for such manual or mechanical cleaning.

Titanium dioxide (TiO₂) coatings are known to provide aphotocatalytically-activated self-cleaning (hereinafter “PASC”) surfaceon a substrate. Publications directed to the formation of a PASCtitanium dioxide coating on a glass substrate include U.S. Pat. No.5,595,813 and “Photooxidative Self-cleaning Transparent Titanium DioxideFilms on Glass”, Paz et al., J. Mater. Res., Vol. 10, No. 11, pp.2842–48 (November 1995). Further, a bibliography of patents and articlesrelating generally to the photocatalytic oxidation of organic compoundsis reported in Bibliography of Work On The Photocatalytic Removal ofHazardous Compounds from Water and Air, D. Blake, National RenewableEnergy Laboratory (May 1994) and in an October 1995 update and anOctober 1996 update.

A presently available method of applying a PASC coating (e.g. a titaniumdioxide PASC coating) to a substrate is the sol-gel method. With thesol-gel method an uncrystallized alcohol-solvent-based colloidalsuspension (the sol) is spray, spin, or dip coated onto a substrate ator about room temperature. The substrate is then heated to a temperaturewithin the range of about 100° C. to 800° C. (212° F. to 1472° F.), toeither bond the PASC coating to the substrate and/or to cause thecrystallization of the PASC coating, in order to form a crystallizedPASC coating (the gel) on the substrate.

One limitation of applying a sol-gel PASC coating is that the sol-gelcoating method is not economically or practically compatible withcertain application conditions or substrates. For example, when it isdesired to provide a PASC coating on a float ribbon during manufacturethereof, the ribbon may be too hot to accept the sol depending in part,on the solvent used in the sol solution. For many solvents used insol-gel process, it is required to cool the hot float ribbon to aboutroom temperature before applying the sol, and to reheat the float ribbonto a temperature sufficient to crystallize the sol into a PASC coating.Such cooling and reheating operations require a substantial investmentin equipment, energy and handling costs, and significantly decreaseproduction efficiency.

The PASC activity of PASC coatings may be significantly reduced ordestroyed if sodium ions are present in the substrate and migrate fromthe substrate into the PASC coating. This process is known as sodiumpoisoning or sodium ion poisoning. For many substrates which containsodium ions, the rate of migration of sodium ions into coatingsincreases as the temperature of the substrate increases. Thus anotherlimitation of the sol-gel coating method is that reheating the substrateincreases the opportunity for sodium ion migration, and in turn, sodiumion poisoning of a PASC coating.

Another limitation of forming PASC coatings by the sol-gel method is thethickness of the coatings e.g. several microns thick. Such thick PASCcoatings may have an adverse affect on the optical and/or aestheticproperties of PASC coated articles.

As can be appreciated from the foregoing, a need exists for an articleof manufacture having a PASC coating deposited therein and for a methodof depositing a PASC coating that does not suffer from the drawbacksknown in the art.

SUMMARY OF THE INVENTION

The present invention is directed to a PASC article of manufacture whichincludes a substrate having at least one surface and a PASC coating,e.g. titanium dioxide, deposited over the surface of the substrate by aprocess selected from the group consisting of chemical vapor deposition(hereinafter “CVD”), spray pyrolysis and magnetron sputtered vacuumdeposition (hereinafter “MSVD”). The present invention is also directedto a method of making such an article of manufacture.

The present invention is also directed to a PASC article of manufacturewhich includes a substrate having at least one surface, a sodium iondiffusion barrier (hereafter “SIDB”) layer e.g. tin oxide, titaniumdioxide, aluminum oxide layers and mixtures thereof deposited over thesurface of the substrate, and a PASC coating e.g. a titanium dioxidecoating deposited over the SIDB layer. The PASC coating and the SIDBlayer are each deposited by a process selected from the group consistingof CVD, spray pyrolysis and MSVD. The present invention is also directedto a method of making such an article of manufacture.

DESCRIPTION OF THE DRAWINGS

FIG. 1 is an elevational view of a portion of a substrate having a PASCcoating dispersed thereon.

FIG. 2 is a view similar to the view of FIG. 1 illustrating an SIDBlayer interposed between the substrate and the PASC coating.

FIG. 3 is a schematic view of selected components of a CVD coater.

FIG. 4 is a schematic view of selected components of a spray pyrolysiscoater.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

Referring now to FIG. 1, there is shown an article 20 having features ofthe present invention. The article 20 includes a substrate 22 havingdeposited thereon a PASC coating 24. The substrate 22 is not limiting tothe invention and may include a glass substrate e.g. a glass sheet or acontinuous glass float ribbon, a plastic substrate, a metal substrateand an enameled substrate.

The PASC coating 24 may be directly over the substrate 22 as shown inFIG. 1 or in the alternative other layers may be interposed between thePASC coating 24 and the substrate 22, e.g. including but not limited toan SIDB layer 26 as shown in FIG. 2 and as described in more detailhereafter. Further, as may be appreciated by those skilled in the art,the PASC coating 24 may be the uppermost layer of a multilayer stack ofcoatings present on substrate 22 or the PASC coating 24 may be embeddedas one of the layers other than the uppermost layer within such amulti-layer stack provided sufficient actinic radiation may pass throughany coatings deposited above PASC coating 24 to photocatalyticallyactivate PASC coating 24 and provided active radicals can pass throughthe coatings deposited above the PASC coating 24 to react with theorganic contaminants present on the uppermost layer of the multilayerstack.

The PASC coating 24 may be any coating which is photocatalyticallyactivated to be self-cleaning and which can be deposited by the CVDmethod, the spray pyrolysis method or the MSVD method. For example butnot limiting to the invention, the PASC coating 24 may include one ormore metal oxides such as titanium oxides, iron oxides, silver oxides,copper oxides, tungsten oxides, zinc oxides, zinc/tin oxides, strontiumtitanate and mixtures thereof. The metal oxide may include oxides,super-oxides or sub-oxides of the metal.

A preferred PASC coating 24 is a titanium dioxide coating. Titaniumdioxide exists in an amorphous form and three crystalline forms, namelythe anatase, rutile and brookite crystalline forms. Anatase phasetitanium dioxide, is preferred because it exhibits strong PASC activitywhile also possessing excellent resistance to chemical attack andexcellent physical durability. Further, anatase phase titanium dioxidehas high transmission in the visible region of the spectrum which givesthin coatings of anatase titanium dioxide with excellent opticalproperties. The rutile phase of titanium dioxide also exhibits PASCactivity. Combinations of the anatase and/or rutile phases with thebrookite and/or amorphous phases are acceptable for the presentinvention provided the combination exhibits PASC activity.

The PASC coating 24 must be sufficiently thick so as to provide anacceptable level of PASO activity. There is no absolute value whichrenders the PASC coating 24 “acceptable” or “unacceptable” becausewhether a PASC coating has an acceptable level of PASC activity islargely determined by the purpose and conditions under which the PASCcoated article is being used and the performance standards selected inconnection with that purpose. In general, thicker PASC coatings providehigher PASC activity. However, other considerations may weigh toward athinner coating, e.g. thinner coatings are preferred when the article isto have high transmission for aesthetic or optical reasons; the surfacecontaminants on the surface of the article are easily removed with athinner PASC coating, the coating is exposed to substantial irradiationand/or the PASC coating 24 will be exposed to sodium ion poisoningdiscussed in more detail below. In a CVD process, aphotocatalytically-active self-cleaning coating 24 is formed which mayrange from about 100 Å to 2500 Å thick. For a wide variety ofapplications, it is preferred that the PASC coating is at least about200 Angstroms (Å), preferably at least about 400 Å and more preferablyat least about 500 Å thick. It has been found that when the substrate 22is a piece of float glass and the PASC coating 24 is an anatase titaniumdioxide PASC coating formed directly over the piece of float glass bythe CVD method, that a thickness of at least about 500 Å provides a PASCreaction rate in the range of about 2 ×10⁻¹ to about 5 ×10⁻³ percentimeter minute (hereinafter “cm⁻¹ min⁻¹”) for the removal of astearic acid test film when the PASC coating was exposed to ultravioletradiation from a light source such as that sold under the trade nameUVA-340 by the Q-Panel Company of Cleveland, Ohio, having an intensityof about 20 watts per square meter (hereinafter W/m²) at the PASCcoating surface which is acceptable for a wide range of applications.

In accordance with the present invention, a thin e.g., less than 1micron, more preferably less than 0.5 micron PASC coating is formed onthe substrate 22 by spray pyrolysis CVD or MSVD methods. In the spraypyrolysis method a metal-containing precursor is carried either in anaqueous suspension, e.g. an aqueous solution, and in the CVD method acarrier gas, e.g. nitrogen gas, and directed toward the surface of thesubstrate 22 while the substrate 22 is at a temperature high enough tocause the metal-containing precursor to decompose and to form a PASCcoating 24 on the substrate 22. In the MSVD method, a metal-containingcathode target is sputtered under negative pressure in an inert oroxygen-containing atmosphere to deposit a sputter coating over substrate22. The substrate 22 during or after coating is heated to causecrystallization of the sputter coating to form the PASC coating 24.

Each of the methods has advantages and limitations e.g. the CVD methodand pyrolysis method are preferred over the spray pyrolysis methodbecause the aqueous solution of the spray pyrolysis method may result inthe presence of OH ions in the PASC coating 24, which may, in turn,inhibit proper crystalline formation in the PASC coating 24 therebyreducing the PASC activity of the coating. The CVD method and pyrolysismethod are preferred over the MSVD method because it is compatible withcoating continuous substrates found at elevated temperatures e.g. glassfloat ribbons. The CVD, spray pyrolysis and MSVD methods of depositingPASC coating 24 are discussed in more detail below. As may beappreciated, spray pyrolysis and CVD methods may be used to deposit thin(e.g., a few hundred Angstrom thick) metal oxide coatings (includingtitanium dioxide coatings) over a substrate. Such coatings are describedin U.S. Pat. Nos. 4,344,986; 4,393,095; 4,400,412; 4,719,126; 4,853,257;and 4,971,843 which patents are hereby incorporated by reference.

Metal-containing precursors that may be used in the practice of thepresent invention to form titanium dioxide PASC coatings by the CVDmethod include but are not limited to titanium tetrachloride (TiCl₄),titanium tetraisopropoxide (Ti(OC₃H₇)₄) (hereinafter “TTIP”) andtitanium tetraethoxide (Ti(OC₂H₅)₄) (hereinafter “TTEt”). Carrier gasesthat may be used in the CVD method include but are not limited to air,nitrogen, oxygen, ammonia and mixtures thereof. The preferred carriergas is nitrogen and the preferred metal-containing precursor is TTIP.The concentration of the metal-containing precursor in the carrier gasis generally in the range of 0.1% to 0.4% by volume for the three listedmetal-containing precursors, but as may be appreciated by those skilledin the art, these concentrations may be varied for othermetal-containing precursors.

Metal-containing precursors that may be used in the practice of theinvention to form PASC coatings by the spray pyrolysis method includerelatively water insoluble organometallic reactants, specifically metalacetylacetonate compounds, which are jet milled or wet ground to aparticle size of less than about 10 microns and suspended in an aqueousmedium by the use of a chemical wetting agent. A suitable metalacetylacetonate to form a titanium dioxide PASC coating is titanylacetylacetonate (TiO(C₅H₇O₂)₂). The relative concentration of the metalacetylacetonate in the aqueous, suspension preferably ranges from about5 to 40 weight percent of the aqueous suspension. The wetting agent maybe any relatively low foaming surfactant, including anionic, nonionic orcationic compositions, although nonionic is preferred. The wetting agentis typically added at about 0.24% by weight, but can range from about0.01% to 1% or more. The aqueous medium is preferably distilled ordeionized water. Aqueous suspensions for pyrolytic deposition ofmetal-containing films are described in U.S. Pat. No. 4,719,127particularly at column 2, line 16, to column 4, line 48, which is herebyincorporated herein by reference.

For both the CVD and the spray pyrolysis methods, the temperature of thesubstrate 22 during formation of the PASC coating 24 thereon must bewithin the range which will cause the metal containing precursor todecompose and form a coating having PASC activity (e.g. crystallinephase for metal oxide PASC coatings). As may be appreciated, the lowerlimit of this temperature range is largely affected by the decompositiontemperature of the selected metal-containing precursor. For the abovelisted titanium-containing precursors, the minimum temperature ofsubstrate 22 which will provide sufficient decomposition of theprecursor is within the temperature range of about 400° C. (752° F.),about 500° C. (932° F.). The upper limit of this temperature range maybe affected by the substrate being coated. For example where thesubstrate 22 is a glass float ribbon and the PASC coating 24 is appliedto the float ribbon during manufacture of the float ribbon, the floatglass may reach temperatures in excess of 1000° C. (1832° F.). The floatglass ribbon is usually attenuated or sized (e.g. stretched orcompressed) at temperature above 800° C. (1472° F.). If the PASC coating24 is applied while the float glass before or during attenuation, thePASC coating 24 may crack or crinkle as the float ribbon is stretched orcompressed respectively. Therefore, in the practice of the invention itis preferred to apply the PASC coating when the float ribbon isdimensionally stable e.g. below about 800° C. (1472° F.) for soda limesilica glass, and the float ribbon is at a temperature to decompose themetal-containing precursor e.g. above about 400° C. (752° F.).

Forming PASC coating 24 by CVD or spray pyrolysis methods isparticularly well suited for practice during the manufacture of theglass float ribbon. In general, a glass float ribbon is manufactured bymelting glass batch materials in a furnace and delivering the refinedmolten glass onto a bath of molten tin. The molten glass on the bath ispulled across the tin bath as a continuous glass ribbon while it issized and controllably cooled to form a dimensionally stable glass floatribbon. The float ribbon is removed from the tin bath and moved byconveying rolls through a lehr to anneal the float ribbon. The annealedfloat ribbon is then moved through cutting stations on conveyor rollswhere the ribbon is cut into glass sheets of desired length and width.U.S. Pat. Nos. 4,466,562 and 4,671,155 hereby incorporated by referenceprovide a discussion of the float glass process.

Temperatures of the float ribbon on the tin bath generally range fromabout 1093.3° C. (2000° F.) at the delivery end of the bath to about538° C. (1000° F.) at the exit end of the bath. The temperature of thefloat ribbon between the tin bath and the annealing lehr is generally inthe range of about 480° C. (896° F.) to about 580° C. (1076° F.); thetemperatures of the float ribbon in the annealing lehr generally rangefrom about 204° C. (400° F.) to about 557° C. (1035° F.) peak.

U.S. Pat. Nos. 4,853,257; 4,971,843; 5,536,718; 5,464,657; and 5,599,387hereby incorporated by reference describe CVD coating apparatus andmethods that may be used in the practice of the invention to coat thefloat ribbon during manufacture thereof. Because the CVD method can coata moving float ribbon yet withstand the harsh environments associatedwith manufacturing the float ribbon, the CVD method is well suited toprovide the PASC coating 24 on the float ribbon. The CVD coatingapparatus may be employed at several points in the float ribbonmanufacturing process. For example, CVD coating apparatus may beemployed as the float ribbon travels through the tin bath after it exitsthe tin bath, before it enters the annealing lehr, as it travels throughthe annealing lehr, or after it exits the annealing lehr.

As may be appreciated by those skilled in the art, concentration of themetal-containing precursor in the carrier gas, the rate of flow of thecarrier gas, the speed of the float ribbon (the “line speed”), thesurface area of the CVD coating apparatus relative to the surface areaof the float ribbon, the surface areas and rate of flow of exhaustedcarrier gas through exhaust vents of the CVD coating apparatus moreparticularly, the ratio of exhaust rate through the exhaust vents versusthe carrier gas input rate through the CVD coating unit, known as the“exhaust matching ratio” and the temperature of the float ribbon areamong the parameters which will affect the final thickness andmorphology of the PASC coating 24 formed on float ribbon by the CVDprocess.

U.S. Pat. Nos. 4,719,126; 4,719,127; 4,111,150; and 3,660,061 herebyincorporated by reference describe spray pyrolysis apparatus and methodsthat may be used with the float ribbon manufacturing process. While thespray pyrolysis method like the CVD method is well suited for coating amoving float glass ribbon, the spray pyrolysis has more complexequipment than the CVD equipment and is usually employed between theexit end of the tin bath and the entrance end of the annealing lehr.

As can be appreciated by those skilled in the art, the constituents andconcentration of the pyrolytically sprayed aqueous suspension, the linespeed of the float ribbon, the number of pyrolytic spray guns, the spraypressure or volume, the spray pattern, and the temperature of the floatribbon at the time of deposition are among the parameters which willaffect the final thickness and morphology of the PASC coating 24 formedon the float ribbon by spray pyrolysis.

As is known by those skilled in the art, the surface of the glass floatribbon on the molten tin (commonly referred to as the “tin side”) hasdiffused tin in the surface which provides the tin side with a patternof tin absorption that is different from the opposing surface not incontact with the molten tin (commonly referred to as “the air side”).This characteristic is discussed in Chemical Characteristics of FloatGlass Surfaces, Seiger, J., JOURNAL OF NON-CRYSTALLINE SOLIDS, Vol. 19,pp. 213–220 (1975); Penetration of Tin in The Bottom Surface of FloatGlass: A Synthesis, Columbin L. et al., JOURNAL OF NON-CRYSTALLINESOLIDS, Vol. 38 & 39, pp. 551–556 (1980); and Tin Oxidation State, DepthProfiles of Sn ²⁺ and Sn ⁴⁺ and Oxygen Diffusivity in Float Glass byMössbauer Spectroscopy, Williams, K. F. E. et al., JOURNAL OFNON-CRYSTALLINE SOLIDS, Vol. 211, pp. 164–172 (1997), which disclosuresare hereby incorporated by reference. As may be appreciated by thoseskilled in the art, the PASC coating 24 may be formed on the air side ofthe float ribbon while it is supported on the tin bath (by the CVDmethod); on the air side of the float ribbon after it leaves the tinbath by either the CVD or spray pyrolysis methods and on the tin side ofthe float ribbon after it exits the tin bath by the CVD method. When thePASC coating 24 is formed on the tin side of float ribbon, it isexpected that the tin and/or tin oxide present in glass surface willfunction as an SIDB layer 26 for the PASC coating 24 disposed thereon.

U.S. Pat. Nos. 4,379,040; 4,861,669; 4,900,633; 4,920,006; 4,938,857;5,328,768; and 5,492,750 hereby incorporated by reference describe MSVDapparatus and methods to sputter coat metal oxide films on a substrate,including a glass substrate. The MSVD process is not generallycompatible with providing a PASC coating over a glass float ribbonduring its manufacture because, among other things, the MSVD processrequires negative pressure during the sputtering operation which isdifficult to form over a continuous moving float ribbon. However, theMSVD method is acceptable to deposit the PASC coating 24 on substrate 22e.g., a glass sheet. As can be appreciated by those skilled in the art,the substrate 22 may be heated to temperatures in the range of about400° C. (752° F.) to about 500° C. (932° F.) so that the MSVD sputteredcoating on the substrate crystallizes during deposition process therebyeliminating a subsequent heating operation. Heating the substrate duringsputtering is not a preferred method because the additional heatingoperation during sputtering may decrease throughput. Alternatively thesputter coating may be crystallized within the MSVD coating apparatusdirectly and without post heat treatment by using a high energy plasma,but again because of its tendency to reduce throughput through an MSVDcoater, this is not a preferred method.

It was customary to attain a desired degree of oxidation in titaniumoxide films by an evaporation technique carried out in two distinctstages; first, by depositing titanium oxide in an under-oxidized stateand thereafter, by introducing an oxidizing atmosphere thereto to attainthe desired degree of oxidation. It has been found according to thepresent invention that the titanium oxide can be successfullymagnetically enhanced sputtered onto the substrate with the degree ofoxidation desired, thus eliminating the need for further oxidation.Deposition of ideally oxidized titanium oxide films is also more easilycontrolled in the practice of the present invention than heretofore,yielding a more consistent final product. It is believed that thepreferred titanium oxide films deposited according to the presentinvention comprise a combination of titanium dioxide intermixed withatoms and/or small agglomerations of titanium metal. i.e. films oftitanium oxide having greater than 1.7 but less than 2.0 parts oxygen toparts titanium, and preferably between 1.9 and 2.0. Such films may becharacterized as having an optical extinction coefficient between about0.03 and 0.3, preferably between 0.03 and 0.09, and most preferablybetween 0.06 and 0.08. The titanium oxide layer is preferably depositedwith a thickness within the range of about 200 to 500 Angstroms toobtain the desired optical properties and film continuity.

The titanium oxide layer can be deposited according to the presentinvention by magnetically sputtering a titanium metal cathode in anevacuated atmosphere having partial pressures of oxygen and argon.Initially, the coating chamber 12 is evacuated to less than 3×10−5 torr,after which an atmosphere of about 75% argon and 25% oxygen at a totalpressure of about 6×10−4 torr is established. The cathode is activatedat a preselected constant electrical power, and the deposition rate andtotal chamber pressure are established at preselected values. Uponreaching the desired coating conditions, the cathode is scanned acrossthe surface of the substrate at a preselected rate to deposit a thinlayer of an ideally oxide film thereon. The luminous transmittance ofthe substrate is monitored during deposition by the photometer andphotoelectric cell and decreases as the thickness of the film increases,from an initial value of about 90% for a glass substrate. Depositionrate, and therefore the degree of oxidation of the deposited titaniumoxide film, is maintained constant either cyclically, or continuously,utilizing the embodiment of the invention. Deposition of the titaniumoxide layer can be terminated when the luminous transmittance decreasesto a value between about 72% and 76%. (about 80% to 85% of thetransmittance of the uncoated substrate) a condition which is usuallyreached with a film thickness between about 300 Å and 350 Å, entailingabout 5 to 7 passes of the cathode over the substrate. Generally duringthe above-described procedure, the oxygen input rate is graduallyincreased to compensate for decreasing amounts of outgassing from thecoating chamber. The titanium oxide layer can have has an opticalextinction coefficient between about 0.06 and 0.08 upon deposit.according to the present invention.

The preferred method to provide a PASC coating using the MSVD method isto sputter a coating on the substrate, remove the coated substrate fromthe MSVD coater and thereafter heat treat the coated substrate tocrystallize the sputter coating into the PASC coating 24. For example,but not limiting to the invention, with the MSVD method, a target oftitanium metal sputtered in an argon/oxygen atmosphere having about5–50%, preferably about 20% oxygen, at a pressure of about 5–10millitorr to sputter deposit a titanium dioxide coating of desiredthickness on the substrate 22. The coating as deposited is notcrystallized. The coated substrate is removed from the coater and heatedto a temperature in the range of about 400° C. (752° F.) to about 600°C. (1112° F.) for a time period sufficient to promote formation of thePASC crystalline form of titanium dioxide to render PASC activity.Generally at least an hour at temperature in the range of about 400° C.(752° F.) to about 600° C. (1112° F.) is preferred. Where the substrate22 is a glass sheet cut from a glass float ribbon, the PASC coating 24may be sputter deposited on the air side and/or the tin side.

The substrate 22 having the PASC coating 24 deposited by the CVD, spraypyrolysis or MSVD methods may be subsequently subjected to one or morepost-PASC coating annealing operations to increase the self-cleaningactivity of the PASC coating 24. It is believed that such post-PASCcoating annealing may increase self-cleaning activity of the PASCcoating 24 by promoting formation of the desired PASC crystalline phase.As may be appreciated, the time and temperatures of the anneal may beaffected by several factors, including the makeup of substrate 22, themakeup of PASC coating 24, the thickness of the PASC coating 24, andwhether the PASC coating 24 is directly on the substrate 22 or is onelayer of a multilayer stack on substrate 22. It has been determined thatwhere the substrate 22 is a piece of float glass and the PASC coating isa 400 Å or 625 Å thick anatase titanium dioxide formed by the spraypyrolysis method, that annealing the coating at 500° C. (932° F.) for upto 13 minutes increased PASC activity.

As discussed above, whether the PASC coating is provided by the CVDprocess, the spray pyrolysis process or the MSVD process, where thesubstrate 22 includes sodium ions that can migrate from substrate 22into the PASC coating deposited on substrate 22, the sodium ions mayinhibit or destroy the photocatalytic activity of the PASC coating byforming inactive compounds while consuming titanium e.g. by formingsodium titanates or by causing recombination of photoexcited charges.

It has been found that the PASC coating may be formed over a sodium ioncontaining substrate 22 without loss of photocatalytic activity by: 1)providing for a limited partial sodium ion poisoning of a portion of thePASC coating; and/or 2) providing an SIDB layer 26. Each method isdiscussed in detail below.

It has been found that when the thickness of the PASC coating exceeds aminimum threshold value, the PASC activity is not destroyed by sodiumion migration even though the PASC coating is deposited over the surfaceof a sodium-ion containing substrate while the substrate is at atemperature sufficient to cause migration of sodium ions from substrateinto the PASC coating. While the mechanism for this result is notcompletely understood, it is believed that when the thickness of thePASC coating exceeds this minimum thickness, the sodium ions are able tomigrate only through a fraction of the overall thickness of the PASCcoating during the time period at which the temperature of substrateexceeds the temperature which permits sodium ion migration. Thereafter,when the temperature of substrate falls below that which causes sodiumion migration, the sodium ions migration stops or “freezes” in place,resulting in a thickness of the PASC coating opposite from the substratesurface free of sodium ion poisoning and able to maintain PASC activity.This minimum thickness of the PASC coating as may be appreciated bythose skilled in the art varies with expected parameters such as, butnot limited to, the time at which substrate is held above thetemperature at which sodium ion migration occurs, the use to which thePASC article of manufacture is to be put and the degree of PASC activitydesired or required. It has been found that for a CVD deposited titaniumdioxide PASC coating over a piece of soda-lime-silica flat glass, thethickness of the PASC coating should be a minimum of about 250 Å,preferably a minimum of about 400 Å and more preferably a minimum ofabout 500 Å to permit a sufficient portion of the PASC coating 24 toremain free of sodium ion poisoning and retain its PASC activity.

Referring now to FIG. 2, in an alternative method of preventing sodiumion poisoning of the PASC coating, an SIDB layer 26 is provided betweenthe PASC coating 24 and the substrate 22. The SIDB layer 26 may be theonly layer between the PASC coating 24 and the substrate 22, or it maybe one layer of a multilayer stack. Where a multilayer stack isemployed, it is not required that the SIDB layer 26 be in contact withthe substrate 22, provided the SIDB layer 26 is positioned between thePASC coating 24 and the substrate 22 to prevent sodium ion migration(sodium ion shown in FIG. 2 by the number “27”) from the substrate 22 tothe PASC coating 24.

The SIDB layer 26 may be formed of amorphous or crystalline metal oxidesincluding but not limited to cobalt oxides, chromium oxides and ironoxides, tin oxides, silicon oxides, titanium oxides, zirconium oxides,fluorine-doped tin oxides, aluminum oxides, magnesium oxides, zincoxides, and mixtures thereof. Mixtures include but are not limited tomagnesium/aluminum oxides and zinc/tin oxides. As can be appreciated bythose skilled in the art, the metal oxide may include oxides,super-oxides or sub-oxides of the metal. While the thickness of the SIDBlayer necessary to prevent sodium ion poisoning of the PASC coatingvaries with several factors including the time period at which asubstrate will be maintained at temperatures above which sodium ionmigration occurs, the rate of sodium ion migration from the substrate,the rate of sodium ion migration through the SIDB layer, the thicknessof the PASC coating and the degree of photocatalytic activity requiredfor a given application, typically for most applications, the SIDB layerthickness should be in the range of at least about 100 Å, preferably atleast about 250 Å and more preferably at least about 500 Å thick toprevent sodium ion poisoning of the PASC coating layer. The SIDB layermay be deposited over substrate 22 by CVD, spray pyrolysis, or MSVDmethods. Where the spray pyrolysis or CVD methods are employed, thesubstrate 22 is preferably maintained at a temperature of at least about400° C. (752° F.) to ensure decomposition of the metal-containingprecursor to form the SIDB layer. The SIDB layer may be formed by othermethods, including the sol-gel method, which sol-gel method as notedabove is not compatible with the manufacture of a glass float ribbon.

A tin oxide SIDB layer may be deposited on substrate by spray pyrolysisby forming an aqueous suspension of dibutyltin difluoride (C₄H₉)₂SnF₂and water and applying the aqueous suspension to the substrate via spraypyrolysis. In general, the aqueous suspension typically contains between100 to 400 grams of dibutyltin difluoride per liter of water. Wettingagents may be used as suspension enhancers. During the preparation ofthe aqueous suspension, the dibutyltin difluoride particles may bemilled to an average particle size of 1 to 10 microns. The aqueoussuspension is preferably vigorously agitated to provide a uniformdistribution of particles in suspension. The aqueous suspension isdelivered by spray pyrolysis to the surface of a substrate which is at atemperature of at least about 400° C. (752° F.), preferably about 500°C. to 700° C. (932° F. to 1292° F.) whereupon the aqueous suspensionpyrolyzes to form a tin oxide SIDB layer. As may be appreciated, thethickness of SIDB layer formed by this process may be controlled by,among other parameters, the coating line speed, the dibutyltindifluoride concentration in the aqueous suspension and the rate ofspraying.

Alternatively the tin oxide SIDB layer may be formed by the CVD methodon the substrate from a metal-containing precursor such as amonobutyltintrichloride vapor (hereinafter “MBTTCL”) in an air carriergas mixed with water vapor. The MBTTCL vapor may be present in aconcentration of at least about 0.5% in the air carrier gas applied oversubstrate while the substrate is at a temperature sufficient to causethe deposition of a tin containing layer e.g. at least about 400° C.(952° F.), preferably about 500° C. to 800° C. (932° F. to 1472° F.) toform the tin oxide SIDB layer. As may be appreciated the thickness ofthe SIDB layer formed by this process may be controlled by, among otherparameters, the coating line speed, the concentration of MBTTCL vapor inthe air carrier gas and the rate of carrier gas flow.

An SIDB layer formed by the MSVD process is described in U.S. patentapplication Ser. No. 08/597,543 filed Feb. 1, 1996, entitled “AlkaliMetal Diffusion Barrier Layer”, hereby incorporated by reference, whichdiscloses the formation of alkali metal diffusion barriers. The barrierlayer disclosed therein is generally effective at thicknesses of about20 to about 180 Å, with effectiveness increasing as the density of thebarrier increases.

The PASC coatings of the present invention are usuallyphotocatalytically activated to self-cleaning upon exposure to radiationin the ultraviolet range e.g. 300–400 nanometers (hereinafter “nm”) ofthe electromagnetic spectrum. Sources of ultraviolet radiation includenatural sources e.g. solar radiation and artificial sources such as ablack light or an ultraviolet light source such as the UVA-340 lightsource. When using artificial ultraviolet light sources under testingconditions where it is desired to determine how the PASC coating willreact the natural ultraviolet radiation, as may be appreciated, theUVA-340 light source has a photon energy distribution which more closelymatches that of sunlight than does the photon energy distribution of ablack light source, allowing the UVA-340 light source to be used to moreclosely approximate how the PASC coating performs when exposed tosunlight.

The ultraviolet radiation intensity is calibrated to an intensity of atleast about 20 watts per square meter (hereinafter “W/m²”) at the coatedsurface of the coating being tested. The intensity may be calibrated,for example, with an ultraviolet meter such as that sold under thetrademark BLACK-RAY® by Ultraviolet Products, Inc., of San Gabriel,Calif., under the model designation J-221. The light source ispreferably positioned normal to the coating surface being tested.

The ultraviolet radiation source and the PASC coating may be positionedrelative to each other such that the ultraviolet radiation passes firstthrough the PASC coating then through the substrate (i.e. the front or“coating side”). Where the substrate passes ultraviolet radiationtherethrough, the PASC coating and the ultraviolet radiation source maybe positioned relative to each other such that the ultraviolet radiationpasses first through the substrate and then through the PASC coating(i.e. the back or “substrate side”). In still another embodiment, one ormore ultraviolet radiation source may be positioned on each side of thesubstrate having a PASC coating on one or both of the surfaces.

As may be appreciated, it is difficult to define with specificity apreferred ultraviolet radiation source or ultraviolet radiationintensity or ultraviolet radiation source/PASC coating/substraterelative positioning-because many factors affect such considerations.These factors include, among others: the purpose for which the PASCcoating is employed e.g. indoor or outdoor use; the selected ultravioletradiation source e.g. natural or artificial; seasonal or geographiceffects where the ultraviolet radiation source is natural; the desiredor expected duration of ultraviolet radiation exposure; the incidentangle of the ultraviolet radiation with the surface of the PASC coating;the rate of PASC activity expected or desired; the degree to which theultraviolet radiation may be reflected or absorbed by the substrateand/or any other coatings or layers present over the substrate or overPASC coating; the contaminants sought to be removed; the thickness ofthe PASC coating; the composition of the PASC coating; the potential forsodium ion poisoning; and the presence or absence of an SIDB layer.However, it has been found that an ultraviolet radiation intensitywithin the range of about 5 to 100 W/m², preferably at least about 20W/m², as measured at the surface of PASC coating from an ultravioletradiation source positioned over the surface of the PASC coating willproduce sufficient intensity to cause satisfactory PASC activity formany self-cleaning applications.

It is useful to be able to measure and compare the PASC effectiveness oractivity of PASC coatings in order to evaluate the PASC activity of aPASC coating. A known, readily available organic contaminant may beapplied over the PASC coating, and upon photocatalytically activatingthe PASC coating, the ability of the PASC coating to remove the organiccontaminant may be observed and measured. Stearic acid, CH₃(CH₂)₁₆COOH,is a model organic “contaminant” to test the PASC activity of PASCcoatings, because stearic acid is a carboxylic acid with a longhydrocarbon chain and is therefore a good “model molecule” for thosepresent in common contaminants such as household oils and dirt. Thestearic acid may be applied over the PASC coating as a thin test film byany convenient technique including dipping, spraying, spin coating.Generally stearic acid test films ranging from about 100 Å to about 200Å thick provide an adequate test film. The stearic acid may be appliedas a stearic acid in methanol solution and a solution having aconcentration of about 6×10⁻³ moles of stearic acid per liter ofsolution has been found to be satisfactory.

The PASC activity of PASC coatings may be estimated qualitatively byovercoating PASC coating with a stearic acid film (the film generallyappears as a light brown coating when applied over the PASC coating)exposing the stearic acid film to ultraviolet radiation at a desiredintensity for a desired interval, and examining the stearic acid filmwith the unaided eye for either the complete disappearance of thestearic acid test film or for a decrease in the darkness of the stearicacid film in comparison to a portion of the stearic acid film appliedover the PASC coating but not exposed to ultraviolet radiation.

The PASC activity of PASC coatings may also be measured quantitativelyby measuring the integrated intensity of the carbon-hydrogen(hereinafter “C—H”) stretching vibrational absorption bands of thestearic acid present on the PASC coating. The integrated intensity iscommensurate with the thickness of stearic acid film remaining on thesurface of the PASC coating, and removal of the stearic acid film byphotocatalytically-activated self-cleaning is expected to result in adrop in the C—H stretching vibrational band intensity. The C—H bondspresent in the stearic acid absorb infrared radiation which unlikeultraviolet radiation, does not photocatalytically activate the PASCcoating. This absorption generally occurs between 2800 and 3000 cm⁻¹wave numbers, and may be measured with a Fourier Transform InfraredSpectrophotometer (hereinafter “FTIR Spectrophotometer”). The FTIR maybe equipped with a detector such as a deuterated triglycine sulfacedetector (hereinafter “DTGS detector”) or a mercury-cadmium-telluridedetector (hereinafter “MCT detector”). The MCT detector is preferred asit provides a much higher signal-to-noise ratio than the DTGS detector.This can be important where the substrate and/or other coatings inaddition to the PASC coating to absorb the infrared radiation which isused by the spectrophotometer to generate the absorption spectrum. Whenthe infrared radiation is absorbed by the substrate and/or othercoatings, the intensity of the infrared radiation beam that passesthrough the stearic acid film, PASC coated, and substrate to thedetector is significantly reduced. Combining this with the lowconcentration of stearic acid present on the surface of the PASC coating(which produces a very weak infrared radiation absorption feature) andthe resultant infrared radiation signal is not particularly intense.Therefore, an instrument equipped with the MCT detector provides aspectrum in which the signal-to-noise ratio is about an order ofmagnitude higher than those equipped with DTGS detectors. When measuringthe PASC activity of a stearic acid test film deposited over films andsubstrates through which the infrared radiation beam may pass, theinfrared radiation beam may be directed through the films and substrateonto the detector positioned on the opposite side of the sample beingtested. Where the films or substrates will not permit the passage ofinfrared radiation therethrough, the infrared radiation beam may bedirected at an angle over the surface, passing through the stearic acidtest film and reflecting off of the substrate as opposed to passingtherethrough onto the detector. This latter method is known asreflection IR spectroscopy.

A PASC reaction rate may be determined for a PASC coating by measuringthe rate at which the PASC coating reacts to remove the stearic acidfilm thereon when the PASC coating is exposed to actinic radiation. Moreparticularly, the rate of decrease in the integrated intensity of theC—H stretching vibrational feature (directly proportional to surfacecoverage) with accumulated time of exposure to actinic (hereafterassumed to be ultraviolet) radiation provides the PASC reaction rate.For example, an initial PASC activity is measured with the FTIRspectrophotometer for a stearic acid test film present on a PASCcoating. The PASC coating may or may not have been exposed toultraviolet radiation for this initial PASC activity measurement. Thestearic acid coated PASC coating is then exposed to ultravioletradiation for a measured interval of time, at the end of which a secondPASC activity measurement is made with the FTIR spectrophotometer. Theintegrated intensities of the C—H stretching vibrations in the secondmeasurement is expected to be lower than in the first, due to the factthat a portion of the stearic acid test film was removed with theexposure to ultraviolet radiation. From these two measurements, a curvemay be plotted of integrated intensity of C—H stretching vibrationsversus time, the slope of which provides the PASC reaction rate. Whiletwo points will suffice to provide a curve, it is preferred that severalmeasurements are taken during the course of a PASC activity measurementto provide a more accurate curve. While the duration of exposure toultraviolet radiation between FTIR measurements may be kept constant ormay be varied when accumulating more than two PASC activity measurements(as it is the cumulated time of exposure to ultraviolet radiation thatis used to plot the curve), the intensity and orientation (coating sideor substrate side) of the ultraviolet radiation should be kept constantfor all PASC measurements taken when determining the PASC reaction rate.

The PASC reaction rate may be reported in the units of cm⁻¹ min⁻¹, wherethe higher the value indicates a greater PASC activity. There is noabsolute rate which renders a PASC coating “acceptable” or“unacceptable” because whether the PASC coating has an acceptable levelof PASC is largely determined for the purpose for which the PASC coatedarticle is used and the performance standards selected in connectionwith that purpose. For most applications, a PASC activity of at leastabout 2×10⁻³, more preferably at least about 5×10⁻³ cm⁻¹ min⁻¹ isdesired.

It is also useful to measure the thickness of the PASC coatings in orderto meaningfully determine and compare the PASC activity of PASC coatingsprepared in accordance with the present invention because PASC coatingthickness may affect photocatalytic activity as demonstrated in theexamples below. The thicknesses of the PASC coating 24 and/or SIDB layer26, if present may be determined by either Variable Angle SpectroscopicEllipsometry (hereinafter “VASE”) or from profilometer measurements of adeletion edge in the measured film, or may be estimated frominterference colors, as is known in the art.

The particle size of the PASC coating 24 and/or SIDB layer 26, ifpresent may be calculated from X-ray Diffraction (hereinafter “XRD”)data using the Scherrer relationship. This relationship is known in theart and a discussion of it may be found in Chapter 9 of X-RAYDIFFRACTION PROCEDURES FOR POLYCRYSTALLINE AND AMORPHOUS MATERIALS, Klugand Alexander, John Wiley & Sons, Inc. (1954).

The following examples of the present invention are presented forillustration and the invention is not limited thereto.

EXAMPLE 1 2100 Å Thick PASC Coating Formed by the CVD Process

The PASC activity of a titanium dioxide PASC coating having a thicknessof about 2100 Å was investigated as follows. A PASC coating wasdeposited using the CVD process on substrate 22 which was the air sideof a piece of soda-lime-silica float glass sold under the trademarkSOLEX® glass by PPG Industries, Inc., of Pittsburgh, Pa. With referenceto FIG. 3, the piece of Solex® glass measured approximately 5.5 incheswide by 12 inches long by 0.016 inches thick (14 cm wide by 30.5 cm longby 0.4 cm thick) and was coated with a titanium dioxide PASC coatingusing a CVD coater 88 as shown in FIG. 3. The CVD coater 88 generallyconsists of three zones shown in FIG. 3 separated by vertical dashedlines 90 and 92. The three zones include a preheat zone 94, a coatingzone 96 and an annealing zone 98. The piece of Solex® glass, designatedhereinafter as substrate 22, was moved through the three zones on anendless conveyor 102 in the direction of arrow 104.

The substrate 22 was moved into the preheat zone 94 and was preheated toa temperature of about 649° C. (about 1200° F.) by a plurality ofheaters 106 spaced above and below the conveyor 102. The substrate 22was moved by the conveyor 102 into the CVD coating zone 96. As may beappreciated, the CVD coating zone 96 includes at least one coating unit97. In order to deposit more than one coating in succession, coatingzone 96 may include a plurality coating units 97. The coating unit 97includes supporting sub-systems and controls such as a gas deliverysub-system, a liquid delivery sub-system, temperature controls, anexhaust sub-system and controls and a temperature and pressuremonitoring sub-system, none of which is shown. The gas deliverysub-system controls the flow of carrier gas to the surface of thesubstrate 22. Nitrogen gas was used as a carrier gas. The inlet nitrogenstream was controlled to a temperature of 113° C. (about 235° F.) byheaters not shown. NH₃ was included in the carrier gas at 20% of thetotal flow rate. The exhaust flow rate was 125% match of the inlet flowrate. The metal-containing precursor used to deposit the titaniumdioxide PASC coating on the substrate 22 was TTIP which was present at0.4% by volume of total flow and was also supplied at a temperature ofabout 113° C. (about 235° F.). The total flow of N₂, NH₃ and TTIP vaporthrough the CVD coater 88 was 75 standard liters per minute (slm). Theline speed of the conveyor 102 was about 50 inches (127 cm) per minute,and the coating unit slot width was about 3/16 inch (0.48 cm). Thesubstrate 22 was maintained at a temperature of about 554° C. (1030° F.)while under the coating unit 97, while a coating 24 was deposited on thesubstrate 22 to form coated sample 100. An approximately 2100 Å thick(as measured by VASE) titanium dioxide PASC coating 24 was formed oncoated sample 100.

The coated sample 100 was then advanced to the annealing zone 98 whereit was annealed from an initial temperature of about 549° C. (1020° F.)to a final temperature of about 121° C. (250° F.) over a period of about26 minutes.

The PASC coated sample 100 was subjected to XRD analysis. The particlesize of the PASC coating 24 was determined to be about 309 Å ascalculated using the Scherrer relationship. The coated sample 100 showedstrong peaks in the XRD pattern corresponding to anatase titaniumdioxide.

The PASC coated sample 100 was then overcoated with a stearic acid testfilm to measure its photocatalytic activity. A stearic acid/methanolsolution having a concentration of about 6×10⁻³ moles of stearic acidper liter of solution was applied by pipetting the stearic acid solutionat a rate of about 2 ml/10 seconds over the center of the sample 100,while the coated sample 100 was spinning at a rate of about 1000revolutions per minutes, whereupon the stearic acid flowed across thesurface of the coated sample 100, by centrifugal force to provide astearic acid film of generally uniform thickness on the surface of thecoated sample 100, ranging from about 100 to 200 Å in thickness. Theterm “generally” is used in the foregoing because the thickness of thestearic acid layer was not constant along the length of the coatedsample 100, but was thickest at the ends of the coated sample 100 andthinnest at the center of the coated sample 100 due to the appliedcentrifugal force. As may be appreciated, the described stearic acidsolution concentrations, spin rate, sample size and pipetting rate maybe modified to obtain stearic acid coatings of desired thicknesses.Under the above-described parameters, the average thickness of thestearic acid test film was about 150 Å, as determined by calibration ofIR intensity with quartz crystal microbalance.

The stearic acid test film/titanium dioxide PASC coated sample 100 wasexposed to ultraviolet radiation from a black light source normal tocoating side of the coated sample 100, providing an intensity of about20 W/m² at the surface of the PASC coating 24 for about a cumulated 30minutes to induce photocatalytically-activated self-cleaning of thestearic acid test film. Periodic FTIR spectrophotometer measurementswere made over the cumulated 30 minute ultraviolet light exposure periodusing an FTIR spectrophotometer equipped with an MCT detector toquantitatively measure photocatalytic activity. More particularly, thestearic acid test film/PASC coated sample 100 was exposed to ultravioletradiation for a measured period of time, after which the coated sample100 was placed in the FTIR spectrophotometer where the integrated areaunder the C—H absorption band of stearic acid was measured to determinePASC activity. The coated sample 100 was again exposed to ultravioletradiation for an additional measured period of time to remove additionalstearic acid, after which another FTIR measurement was made. Thisprocess was repeated, and a plot of the integrated IR absorptionintensity of the C—H stretching vibrations versus cumulated time ofexposure to ultraviolet light was obtained, the slope of which providedthe PASC rate for the stearic acid test film/titanium dioxide PASCcoated sample 100. As may be appreciated, all FTIR measurements weretaken over about the same area of coated sample 100 in order tominimized the affect of variations in the thickness of the stearic acidtest film as described above. The photocatalytic reaction rate wasdetermined to be 3.53×10⁻³ cm⁻¹ min⁻¹ which is approaching the valuesfor PASC coated substrates which contain little or no sodium ions (e.g.quartz glass substrates) indicating that the 2100 Å thickness of thetitanium dioxide PASC coating was sufficient to overcome sodium ionpoisoning.

EXAMPLE 2 700–800 Å Thick PASC Coating Formed by the CVD Process

A titanium dioxide PASC coating 24 having a thickness of about 700–800 Åwas deposited on a glass substrate via the CVD process in the samemanner as in Example 1, with the following exceptions.

The glass composition used in Example 2 was 3 mm (0.12 inch) thick clear(i.e. low iron soda lime silica) glass. The preheat temperature ofExample 2 was 593° C. (1100° F.). The TTIP concentration in Example 2was 0.1% with a total flow rate of 50 slm. NH₃ was included in thecarrier gas at 24% of the total flow rate. The line speed was 30 inchesper minute (76.2 cm per minute). The slot width was 1/16 inch. Thethickness of the titanium dioxide PASC coating 24 was estimated frominterference colors, a technique known in the art of thin film thicknessmeasurement, and determined to be within the range of about 700 to 800Angstroms.

A stearic acid test film was applied over the titanium dioxide PASCcoating in the same manner as set forth in Example 1, and after exposureto UV light in the manner described in Example 1 with periodic FTIRspectrophotometer measurements of PASC activity over a 33-hourcumulative period. The photocatalytic reaction rate was determined to beabout 0.17×10⁻³ cm⁻¹ min⁻¹.

The decreased PASC activity of Example 2 is believed to arise from thedifference in titanium dioxide coating thickness between Examples 1 and2, (about 2100 Å versus about 700–800 Å, respectively). Moreparticularly, it is believed that the PASC reaction rate of Example 2was lower than that of Example 1 due to the increased depth of sodiumion diffusion into the titanium dioxide coating of Example 2 as a largerpercentage of the total thickness of the titanium dioxide PASC coatingfor the titanium dioxide PASC coating of Example 2 than that ofExample 1. It is believed that sodium ions migrated from the glasssample into the PASC coating of Example 2 in annealing zone 98. Oneconclusion that may be drawn from a comparison of Examples 1 and 2 isthat in the absence of an SIDB layer, thicker PASC coatings are lesssusceptible to sodium ion poisoning, thus maintaining higher PASCactivity.

EXAMPLE 3 PASC Coating Over an SIDB Layer Formed by the CVD Process

In this example the affect of the presence of a tin dioxide SIDB layeron PASC activity was investigated. More particularly a tin dioxide SIDBlayer was formed over the air side of four pieces of float glass andcertain physical characteristics of the SIDB layer were investigated.Thereafter, sixteen additional pieces of float glass were provided witha tin dioxide SIDB layer by the CVD process, each of which tin dioxideSIDB layer was in turn overcoated with a titanium dioxide PASC coatingby the CVD process. One sample was cut from each of the sixteen PASCcoated/SIDB layer coated/float glass pieces, and these sixteen sampleswere overcoated with a stearic acid test film. The sixteen stearic acidtest film coated/titanium dioxide PASC coated/tin dioxide SIDB layercoated/samples were exposed to ultraviolet radiation and the PASCreaction rates for the samples were determined.

3A. Investigation of SIDB Layer

An SIDB layer was deposited via the CVD process using the CVD apparatusdescribed in Example 1 on the air side of four pieces of glass cut froma soda-lime-silica float glass ribbon which measured about 5 inches by12 inches by 0.16 inch thick (12.7 cm by 30.48 cm by 0.4 cm). Moreparticularly, the SIDB layer was a tin dioxide SIDB layer and the affectof the metal-containing precursor concentration, water vaporconcentration, CVD line speed, preheat temperatures and SIDB layerthickness on the tin dioxide SIDB layer were investigated. Themetal-containing precursor used to form the tin oxide SIDB layer by theCVD process on all four glass pieces was a MBTTCL vapor, which was mixedwith water vapor in an air carrier gas.

A first of the four glass pieces was coated by the CVD process andapparatus of Example 1 with a tin oxide SIDB layer by directing anMBTTCL vapor at about a 1.5% concentration and a water vaporconcentration of about 1.5% in an air carrier gas toward the air side ofthe glass piece. The preheat temperature was about 648° C. (1200° F.)and the line speed was about 50 inches (127 cm) per minute for thisglass piece. The tin oxide SIDB layer formed thereby was about 3500 Åthick as determined by VASE. The resistivity and particle size of theSIDB layer were measured and found to be about 4.6×10⁻³ ohm-cm and 198 Årespectively.

A second glass piece was similarly coated with a tin oxide SIDB layer,however the line speed was decreased to about 20 inches (50.8 cm) perminute and the MBTTCL vapor concentration was decreased to about 0.5%and the water vapor concentration was decreased to about 0.5% in the aircarrier gas. The preheat temperature was maintained at about 648° C.(1200° F.). The tin oxide SIDB layer formed thereby was about 4340 Åthick as determined by VASE. The resistivity was found to be about3.9×10⁻³ ohm-cm and particle size was about 185 Å.

A third of the glass pieces was similarly coated with a tin oxide SIDBlayer, however, preheat temperature was decreased to about 480° C. (900°F.), while the line speed was increased to about 50 inches (127 cm) perminute. The MBTTCL concentration was about 1.5%, water vaporconcentration about 1.5% in an air carrier gas. The resulting tin oxideSIDB layer had a coating thickness of about 1000 Å as determined by VASEand had a resistivity of about 3.8×10⁻² ohm-cm and a particle size ofabout 59 Å.

A fourth glass piece was similarly coated with a tin oxide SIDB layer,however while the preheat temperature was maintained at about 480° C.(900° F.), the line speed was decreased 20 inches (50.8 cm) per minute.MBTTCL concentration was about 0.5%, and water concentration was about0.5% in an air carrier gas. The tin oxide SIDB layer was about 1010 Åthick as determined by VASE, and had a resistivity of about 2×10⁻²ohm-cm and a particle size of about 78 Å.

From the foregoing it was concluded that within the temperature ranges,concentrations, line speeds and SIDB layer thicknesses set forth, whileresistivity or particle size may vary, all four glass pieces were foundto have had a cassiterite structure.

3B. Formation of Titanium Dioxide PASC Coating Formed Over Tin OxideSIDB Layer by the CVD Process

Sixteen additional float glass pieces measuring 5 inches by 12 inches by0.16 inch thick (12.7 cm by 30.48 cm by 0.4 cm) were each coated withthe CVD coater and process as generally described in Example 3A with atin oxide SIDB layer and were then further coated with a titaniumdioxide PASC coating using the CVD coating apparatus and process asgenerally described in Example 1. For this coating operation, theon-line CVD process used a pair of consecutive coating units (one forthe SIDB layer and one for the PASC coating). The PASC coating over theSIDB layer makes separate analysis of the SIDB layer difficult if notimpossible, therefore, it was assumed that the PASC overcoated tin oxidelayers had the same properties as the non overcoated tin oxide layersdescribed in Section 3A above, although both the SIDB layers and thePASC coatings were applied to the sixteen glass pieces under a varietyof specific coating parameters as described in detail below and as setforth in Table 1 below.

Generally, the sixteen tin oxide SIDB layers were deposited from ametal-containing precursor of a MBTTCL vapor in an air carrier gas mixedwith water vapor, also carried in air. The MBTTCL vapor temperature wasmaintained at about 160° C. (320° F.). The total flow rate was 60 slm,and the exhaust matching ratio was 115%. The slot width was 0.16 cm (1/16 inch). The specific coating parameters which were varied for theSIDB layers formed in this example included preheat zone 94 temperature,line speed, MBTTCL concentration, water vapor concentration and SIDBlayer thickness. Shown in Table 1 below are the tin dioxide SIDB layercoating parameters and expected SIDB layer thicknesses for each of thesixteen glass pieces. Actual thickness measurements were not taken;expected thicknesses are based on the results obtained in section 3Aabove. The sixteen pieces are separated in Table 1 into four groups offour substrates each, based upon preheat temperature and line speed.

TABLE 1 SnO₂ SODIUM ION DIFFUSION BARRIER LAYER CVD COATING PARAMETERSH₂O Expected Preheat Line Conc MBTTCL SIDB Layer Group Sample Temp.Speed Vol. Conc Thickness No. No. ° F. in/min % % Å I 1 900 20 0.5 0.51010 2 900 20 0.5 0.5 1010 3 900 20 0.5 0.5 1010 4 900 20 0.5 0.5 1010II 5 900 50 1.5 1.5 1000 6 900 50 1.5 1.5 1000 7 900 50 1.5 1.5 1000 8900 50 1.5 1.5 1000 III 9 1200 20 0.5 0.5 4340 10 1200 20 0.5 0.5 434011 1200 20 0.5 0.5 4340 12 1200 20 0.5 0.5 4340 IV 13 1200 50 1.5 1.53500 14 1200 50 1.5 1.5 3500 15 1200 50 1.5 1.5 3500 16 1200 50 1.5 1.53500

Each of the SIDB coated sixteen glass pieces was in turn overcoated witha titanium dioxide PASC coating deposited from the second CVD coatingunit located downstream of the first SIDB coating unit through which ametal-containing precursor of TTIP vapor carrier in a nitrogen (N₂)carrier gas was directed over the SIDB layer coated surface of the glasspieces. Ammonia (NH₃) was added to the TTIP/carrier gas mixture of eightof the sixteen glass pieces. The carrier gas for all sixteen pieces wasmaintained at a temperature of about 113° C. (235° F.). The sixteenpieces were annealed as in Example 1. The TTIP vaporizer temperature wasmaintained at about 104.4° C. (220° F.). Shown in Table 2 below are thetitanium dioxide PASC coating parameters for the sixteen glass pieces.The sixteen glass pieces are separated in Table 2 into four groups offour pieces each based upon preheat temperature and line speed.

TABLE 2 TiO₂ PHOTOCATALYTICALLY-ACTIVATED SELF-CLEANING COATINGPARAMETERS Preheat Line Total Flow Exhaust Slot Group Sample Temp. SpeedRate Matching TTIP Conc. NH₃ Conc. Width No. No. ° F* in/min L/min % % %Inches I 1 900 20 35 105 0.1 0 1/16 2 900 20 75 105 0.4 0 3/16 3 900 2035 125 0.4 20 1/16 4 900 20 75 125 0.1 20 3/16 II 5 900 50 75 125 0.4 01/16 6 900 50 35 125 0.1 0 3/16 7 900 50 75 105 0.1 20 1/16 8 900 50 35105 0.4 20 3/16 III 9 1200 20 75 125 0.1 0 1/16 10 1200 20 35 125 0.4 03/16 11 1200 20 75 105 0.4 20 1/16 12 1200 20 35 105 0.1 20 3/16 IV 131200 50 35 105 0.4 0 1/16 14 1200 50 75 105 0.1 0 3/16 15 1200 50 35 1250.1 20 1/16 16 1200 50 75 125 0.4 20 3/16 *Preheat temperature hererefers to the temperature of preheat zone 94. There was only one preheatoperation, and the preheat temperatures listed here are the same preheattemperatures to which the glass pieces were raised in the preheat zoneas they moved through CVD coater 88 and first received the SIDB layerfollowed by the PASC coating, before entering the annealing zone 98.

Shown in Table 3 below are selected properties of each of the sixteenglass pieces after the PASC coating as described in Table 2 was applied.PASC coating thicknesses were not measured, but is expected to varywithin each group due to variations in other deposition parameters suchas line speed and precursor concentration. However, surface roughnessand particle size of the PASC coating were determined in order to relatePASC activity to roughness and particle size. Surface roughnessmeasurements were estimated based upon Atomic Force Microscope(hereinafter “AFM”) measurements made of the PASC coating. It was foundthat there was a large variation in surface roughness and particle sizeand crystalline phase as a function of preheat temperature.

TABLE 3 TiO₂ PHOTOCATALYTICALLY-ACTIVATED SELF-CLEANING COATINGPROPERTIES Sample Surface Roughness Particle Size Crystalline Group No.No. Rms Å Phase I 1 4.13 * not detected 2 5.18 * not detected 3 7.87 *anatase/rutile 4 7.84 * anatase/rutile II 5 6.39 * not detected 6 4.38 *not detected 7 5.99 * anatase/rutile 8 7.50 * not detected III 9 14.71 *not detected 10 15.58 277 anatase 11 23.08 121 anatase 12 16.93 166anatase IV 13 13.13 216 anatase 14 15.72 * not detected 15 14.52 * weakanatase 16 15.93 154 anatase *Particle size could not be calculatedbecause either no peaks were detected for the anatase phase in the X-raydiffraction pattern (Samples 1, 2, 5, 6, 8, 9 and 14) or the peaks weretoo broad and weak to measure (Samples 3, 4, 7 and 15).3C. Description of Testing of PASC Activity of the Sixteen Substrates

A 1 inch by 4 inch (2.54 cm×10.16 cm) sample or test strip was cut outof the center of each of the sixteen PASC coated/SIDB coated glasspieces. Each of the sixteen test strips was overcoated by spin coatingwith a stearic acid test film as described in Example 1. The sixteentest strips were then subjected to ultraviolet radiation from a blacklight source at an intensity of 20 W/m² over a 7-hour cumulative timeperiod to induce photocatalytically-activated self-cleaning of thestearic acid test film.

Because the thickness of the stearic acid test film was found to varyalong the length of the 1 inch by 4 inch (2.54 cm×10.16 cm) test strips(i.e. a thicker stearic acid test film at each end of the test stripswith a thinner stearic acid test film toward the center of each teststrip, due to the centrifugal force affecting the stearic acid as it wasdropped onto the center of spinning test strips as described above andas observed visually by changes in interference colors along the lengthof the test strips), photocatalytic activity was measured at each end ofeach of the sixteen test strips using the FTIR Spectrophotometerequipped with the MCT detector. The PASC reaction rates obtained fromFTIR spectroscopy tests for each pair of tests conducted on each of thesixteen test strips are shown in Table 4.

TABLE 4 PHOTOCATALYTICALLY-ACTIVATED SELF-CLEANING ACTIVITY OF SIXTEENTEST STRIPS PASC Activity Rate PASC Activity Group Sample Left Side ofTest Strip Right Side of Test Strip No. No. x 10⁻³ cm⁻¹min⁻¹ x 10⁻³cm⁻¹min⁻¹ I 1 0.39 0.45 2 0.32 0.28 3 0.26 0.31 4 0.4 0.39 II 5 0.5 0.576 0.23 0.14 7 0.27 0.22 8 0.014 0.019 III 9 0.23 0.048 10 0.96 0.77 110.4 0.31 12 0.52 0.43 IV 13 1.18 0.94 14 0.73 0.77 15 0.42 0.41 16 0.250.35

It is evident from Table 4 that for certain test strips there is a verysignificant difference in the activities between two ends of the teststrip. This difference is believed to be related to non-uniformity ofthe thickness of the stearic acid layer on the test strip.

Referring to Table 4, there appears to be a lack of correlation betweendeposition conditions and PASC activity of the PASC coating over theSIDB layer. The three most active test strips as shown on Table 4 areSamples 13, 10 and 14 based on the activities of the left sides of thetest strips. These strips 13, 10 and 14 correspond to the higher preheattemperature of 1200° F. (648.8° C.). If ranked by PASC activity, theremaining 13 test strips show a mix of preheat temperatures, as well asother coating parameters in the ranking indicating that the presence ofa sodium ion diffusion barrier layer may operate to prevent sodium ionpoisoning of the PASC coating layer, and may permit greater latitude incoating conditions and parameters while still obtaining photocatalyticactivity.

EXAMPLE 4 PASC Coating Formed by Spray Pyrolysis

In this example, glass pieces were coated by spray pyrolysis withtitanium dioxide PASC coatings of differing thickness to investigate theaffect of PASC coating thickness on PASC activity.

Three float glass pieces each 4 inch×4 inch×0.16 inch thick (10.16cm×10.16 cm×4 mm) had the air side coated by spray pyrolysis with atitanium dioxide PASC coating.

The basic components of the pyrolytic spray equipment used to apply thePASC coating over the glass pieces are shown in FIG. 4. The spraypyrolysis equipment included a preheat zone 120 and a pyrolytic sprayzone 122. A glass piece 126 was conveyed on a conveyor not shown intothe preheat zone 120 where it was heated by a plurality of electricheaters 130 to a temperature in the range of about 600° to 700° C.(1112° F. to 1292° F.). The glass piece 126 was then conveyed past anoscillating spray nozzle 132, which was positioned about 10 inches (25.4cm) above the air side of the glass piece 126. An aqueous suspension oforganometallic coating reactants 134 was maintained in suspension byagitator 136 in mixing chamber 138. The aqueous suspension 134 was movedthrough tubing 140 to spray nozzle 132 where it was mixed withcompressed air in any convenient manner (from a compressed air source142 which was moved to spray nozzle 132 by tubing 144). A spray pattern146 was formed as the aqueous suspension 134/compressed air mixture wassprayed from nozzle 132 onto the surface of the glass piece 126 and waspyrolyzed to form PASC coating 24 on the glass piece 126. The PASCcoated glass piece 126 was allowed to cool in air.

For this example, the organometallic coating reactant selected wastitanyl acetylacetonate and the rate of aqueous suspension delivered tothe surface of the three glass pieces 126 was controlled so as toprovide a PASC coating thickness on each glass piece. The thicknesseswere 400 Å, 725 Å and 1000 Å. All other coating parameters were heldconstant to determine the effect of PASC coating thickness onphotocatalytic activity for a titanium dioxide PASC coating deposited byspray pyrolysis on clear float glass without an SIDB barrier layer.

Table 5 sets forth the specific coating parameters for this example.

TABLE 5 COATING PARAMETERS FOR SPRAY PYROLYSIS OF TITANIUM DIOXIDE PASCCOATING Concentration Atomizing Line of Delivery Air Deposition TiO₂Sample Speed Coating Organometallic Rate Pressure Temp. Thickness PASCActivity No. in/min Reactant gms/l or rate ml/min lbs/in² ° C. Å x10⁻³cm⁻¹min⁻¹ A 75 titanyl 20 gms/ml 40 ml/min 50 672 400 2 acetyl-acetonate B 75 titanyl 20 gms/ml 55 ml/min 50 677 725 2 acetyl-acetonate C 75 titanyl 27 gms/ml 67 ml/min 50 688 1000 3 acetyl-acetonate

After deposition of the titanium dioxide PASC coating, each of the threeglass pieces was cut into four 1 inch×4 inch (2.54 cm×10.16 cm) teststrips providing a total of 12 test strips.

One test strip from each of the three original glass pieces respectivelywas subjected to x-ray diffraction analysis. From this analysis all ofthe three glass pieces in this example were found by x-ray diffractionanalysis to have strong x-ray diffraction lines matching anatasetitanium dioxide.

To evaluate photocatalytic activity for the three glass pieces, one teststrip from each of the three glass pieces respectively was overcoatedwith a stearic acid test film by the process described in Example 1. Thethree test strips were then exposed to ultraviolet radiation from ablack light source positioned normal to the coated side of each teststrip at an intensity of 20 W/m² over a seven hour cumulative timeperiod. The photocatalytic reaction rate of each of the three teststrips was determined quantitatively by FTIR spectroscopy using an MCTdetector, as described above. The photocatalytic reaction rate for thethree glass pieces is shown in Table 5.

From the foregoing it may be concluded that low but acceptablephotocatalytic reaction rates may be obtained with PASC coatings formedby the spray pyrolysis technique, without sodium ion poisoning of thePASC coating. It may also be concluded that thicker PASC coatings giverise to higher PASC activity, as demonstrated by Sample C in Table 5.

EXAMPLE 5

Comparison of PASC Coatings Formed by Spray Pyrolysis with and withoutSIDB Layer and Investigation of the Affect of Post-PASC CoatingAnnealing

In this experimental matrix eight glass pieces were provided with a PASCcoating by the spray pyrolysis method to evaluate the effect of thepresence and absence of an SIDB layer, the effect of PASC coatingthickness and the effect of substrate temperature during deposition ofthe PASC coating on the PASC reaction rate of PASC coatings.

More particularly, the air side of four of the eight glass pieces of 4mm Solex® float glass were each coated with a 500 Å thick tin dioxideSIDB layer which had been deposited by spray pyrolysis from an aqueoussuspension of dibutyltindifluoride, (C₄H₉)₂SnF₂ and a wetting agent. Thetin dioxide SIDB layer was applied with the spray pyrolysis equipmentand procedure described in Example 4. After coating with the SIDB layer,the glass samples were cooled to room temperature, these four glasspieces and the remaining four glass pieces were each coated with atitanium dioxide PASC coating over the SIDB layer, and were cooled toroom temperature. It should be noted that the four SIDB layer coatedglass pieces which were cooled to room temperature between theapplication of the SIDB layer and the PASC coating and then reheatedprior to the application of the PASC coating, were prepared in thisfashion because the laboratory pyrolytic spray equipment used in theexperiment had only one spray pyrolysis station, thereby requiringchangeover from a dibutyltin difluoride suspension (to provide the SIDBlayer) to a titanyl acetylacetonate suspension (to provide the PASCcoating). Such an intermediate cooling step would be eliminated in apreferred coater, e.g. two spray pyrolysis stations would be provided tosequentially coat an SIDB layer and a PASC coating to a movingsubstrate, such as a continuous float ribbon of glass, without any suchintermediate cooling step.

After all eight PASC coated glass pieces were cooled to roomtemperature, the glass pieces were overcoated with a stearic acid filmdescribed in Example 1 and the films were then exposed to ultravioletradiation with a UVA 340 light source placed normal to the coating sideof the stearic acid test film/PASC coated glass pieces to provide 20W/m² intensity at the PASC coating surface. The PASC reaction rate forthe removal of the stearic acid test film was determined quantitativelyusing the process as described in Example 1. This PASC reaction rate isrecorded in Table 6 below under the column headed 0.00 min. It is to benoted that the 0.00 minute parameter refers to the fact that the glasspiece having the PASC coating thereon after it was allowed to cool toroom temperature and was not annealed; it does not refer to theaccumulated time period of ultraviolet exposure.

The affect of annealing time on stearic acid removal was examined asfollows. The residual stearic acid test film was washed off of the PASCcoating of each of the eight glass pieces by wiping the surfaces with amethanol soaked wiping cloth until no stearic acid film or haze wasobserved. Each of the eight glass pieces was then in turn respectivelyplaced in a furnace maintained at about 500° C. (932° F.) for about 3minutes to heat the respective glass piece. The furnace heat was turnedoff, the furnace door was opened, and the respective glass piece wasallowed to cool in the furnace to about room temperature. The slowcooling rate within the furnace provided the anneal. Each respectiveglass piece was then overcoated with a new stearic acid test film,exposed to ultraviolet radiation and the PASC reaction rate wasdetermined in the same fashion as the non-annealed PASC coatingdescribed immediately above in this example. The residual stearic acidtest film was again washed off the surface of each respective glasspiece as described above, and respective each glass piece was subjectedto additional heating for a ten minute period and allowed to slowly coolin the furnace in the same fashion, resulting in a 13 minute accumulatedheating time period, whereupon a stearic acid test film was reapplied asdescribed and the PASC reaction rate was determined as set forth above.The process was repeated yet another time to obtain a 73 minuteaccumulated heating time period followed by slow cooling in the furnaceto provide the anneal.

The SIDB layer and PASC coating properties and PASC reaction ratesversus accumulative annealing time period for the eight glass pieces(D-K) are shown in the following Table 6.

TABLE 6 PHOTOCATALYTIC ACTIVITY REACTION RATES OF PASC COATINGS WITH ANDWITHOUT SODIUM-ION DIFFUSION BARRIER LAYER Glass Temp. PhotocatalyticActivity* After During Annealing at 500° C. for Barrier TiO₂ TiO₂ 0.00**3 13 73 Sample Layer Thickness Coating min min min min D None 400 Å1145° F. 0.72 1.05 1.94 *** E None 625 Å 1145° F. 0.69 1.05 1.67 2.97 F500 Å 400 Å 1147° F. 2.39 5.02 7.39 *** SnO₂ G 500 Å 625 Å 1152° F. 2.235.35 8.74 5.13 SnO₂ H None 400 Å 1260° F. 2.05 6.59 5.14 *** I None 625Å 1260° F. 4.71 7.99 9.95 5.39 J 500 Å 400 Å 1300° F. 2.4  5.26 3.73 ***SnO₂ K 500 Å 625 Å 1280° F. 4.64 12.29 5.57 4.4 SnO₂ *PASC reaction ratefor removal of stearic acid (x 10⁻³ cm⁻¹min⁻¹)

The results of the photocatalytic analysis shown in Table 6 suggest thata titanium dioxide layer thickness of about 625 Å with no barrier layer(Sample I) can approach the PASC activity of a thinner 400 Å PASCcoating over an SIDB layer (Sample J). It should be noted that forSamples J, the SIDB layer underwent an intermediate cooling andsubsequent reheating operation described, which reheating operation mayhave reduced the SIDB layer effectiveness for Sample J, which mightotherwise have had a higher PASC activity.

Sample K of Table 6 also shows the significant impact annealing time canhave on PASC reaction rate. After 3 minutes anneal time the PASCactivity of Sample K rose from about 4.64 to about 12.29×10⁻³ cm¹ min⁻¹but subsequently dropped with additional annealing. It is believed thatthe anatase phase of the titanium dioxide PASC coating was formingduring annealing when the 3 minute time period PASC activity wasmeasured and was forming without appreciable sodium ion poisoning due tothe presence of the tin oxide in the SIDB layer. While not wishing to bebound to this particular theory, it is believed that continuing toanneal for too long a cumulated time period may induce sodium ionpoisoning, despite the presence of the SIDB layer which would accountfor the decline in PASC activity of Sample K.

The above examples are offered to illustrate the present invention andare not intended to limit the invention.

While the above described methods of providing a PASC coating have beendescribed in connection with providing such coatings on a continuousmoving substrate e.g. a continuous float ribbon of glass duringmanufacture of the substrate, it is to be understood that these methodscould also be utilized downstream of the substrate manufacturingprocess. For example, the PASC coatings could be provided on substratesincluding but not limited to glass substrates, as part of the processesto bend and/or temper the substrate. For example, where a glasssubstrate is heated for subsequent bending and/or tempering, the PASCcoating with or without a SIDB layer may be applied by the spraypyrolysis or CVD or MSVD techniques described above prior tobending/tempering. The CVD and spray pyrolysis methods may be used asthe glass substrate is heated to bending/tempering temperatures. ThePASC coating, with or without an SIDB layer may be applied to the glasssubstrate in a post bending/tempering reheating operation by any of theCVD, spray pyrolysis or MSVD methods.

It is believed that there are differences in the PASC coatings preparedby the sol-gel process and those prepared by the above-describedmethods. For example, it is expected that the PASC coatings prepared bythe sol-gel process may be more porous, less dense, generally thicker,generally less applicable for use in a transparency and may tend tocontain more OH groups than those prepared by the CVD or spray pyrolysisprocesses. As noted above, excess OH groups are undesirable because theymay inhibit proper crystalline formation in the PASC coating which mayin turn reduce PASC activity. It is expected that PASC coatings preparedby the CVD or spray pyrolysis methods would have a finer grain structurethan those prepared by the sol-gel process.

Advantages of the present invention over the sol-gel method of formingPASC coatings include an ability to form a thin dense PASC film on asubstrate as opposed to the much thicker, porous coatings obtained withthe sol-gel coating method. Because the PASC coatings of the presentinvention are thin, they are aesthetically acceptable for use as atransparent coating on glass substrates. Still another advantage is thatthe method of providing a PASC coating according to the presentinvention avoids the need to reheat the substrate after application ofthe coating or coating precursor as is required with the presentlyavailable sol-gel method. Not only does this render the present methodless costly and more efficient e.g. but not limited to less equipmentcosts, less energy costs, less production time but also, the opportunityfor sodium ion migration and in turn sodium ion poisoning of the PASCcoating of the present invention is significantly reduced. Furtherstill, the method of the present invention is easily adapted to theformation of PASC coatings on continuous moving substrates, such as aglass float ribbon, where as the presently available sol-gel methods arenot so easily adaptable.

Various modifications are included within the scope of the invention,which is defined by the following claims.

1. A photocatalytically-activated self-cleaning article of manufacturecomprising: a substrate having at least one surface; and aphotocatalytically-activated self-cleaning coating deposited over thesurface of the substrate at a thickness of less than 1,000 Angstroms bya process selected from the group consisting of chemical vapordeposition, magnetron sputtered vacuum deposition and spray pyrolysis,wherein said photocatalytically-activated self-cleaning coatingcomprises one layer of a multilayer stack of coatings deposited over thesubstrate wherein said photocatalytically-activated self-cleaningcoating is a layer other than the uppermost layer of said multilayerstack.
 2. The photocatalytically-activated self-cleaning article ofclaim 1 further comprising a sodium ion diffusion barrier layer disposedbetween the substrate and the photocatalytically-activated self-cleaningcoating to inhibit migration of sodium ions from said substrate to saidphotocatalytically-activated self-cleaning coating.
 3. Thephotocatalytically-activated self-cleaning article of claim 2 whereinthe sodium ion diffusion barrier layer is deposited over the substrateby a process selected from the group consisting of chemical vapordeposition, magnetron sputtered vacuum deposition and spray pyrolysis.4. The photocatalytically-activated self-cleaning article of claim 2wherein the sodium ion diffusion barrier layer is selected from thegroup consisting a crystalline metal oxide, an amorphous metal oxide andmixtures thereof.
 5. The photocatalytically-activated self-cleaningarticle of claim 4 wherein the sodium ion diffusion barrier layer isselected from the group consisting of tin oxides, silicon oxides,titanium oxides, zirconium oxides, fluorine-doped tin oxides, aluminumoxides, magnesium oxides, zinc oxides, cobalt oxides, chromium oxides,magnesium oxides, iron oxides and mixtures thereof.
 6. Thephotocatalytically-activated self-cleaning article of claim 5 whereinthe sodium ion diffusion barrier layer is at least about 250 Angstromsthick.
 7. The photocatalytically-activated self-cleaning article ofclaim 5 wherein the sodium ion diffusion barrier layer is at least about400 Angstroms thick.
 8. The photocatalytically-activated self-cleaningarticle of claim 5 wherein the sodium ion diffusion barrier layer is atleast about 500 Angstroms thick.
 9. The photocatalytically-activatedself-cleaning article of claim 1 wherein the substrate is selected fromthe group consisting of glass, plastic, metal, enamel and mixturesthereof.
 10. The photocatalytically-activated self-cleaning article ofclaim 1 wherein said substrate is a glass substrate having a first majorsurface and an opposite major surface defined as a second major surface,the first major surface having a thin layer of a tin oxide diffusedtherein characteristic of forming a glass ribbon over a molten tin bath,at least one of the major surfaces having saidphotocatalytically-activated self-cleaning metal oxide coating depositedthereon.
 11. The photocatalytically-activated self-cleaning article ofclaim 10 wherein the photocatalytically-activated self-cleaning coatingfurther comprises a metal oxide selected from the group consisting oftitanium oxides, iron oxides, silver oxides, copper oxides, tungstenoxides, aluminum oxides, silicon oxides, zinc stannates, molybdenumoxides, zinc oxides, strontium titanate and mixtures thereof.
 12. Thephotocatalytically-activated self-cleaning article of claim 10 whereinthe photocatalytically-activated self-cleaning metal oxide coating isdeposited on the first major surface of the glass substrate and theglass substrate is selected from the group consisting of a glass sheetand a continuous float glass ribbon.
 13. A photocatalytically activecoated article comprising: a glass substrate having an air side majorsurface having sodium ions therein and an opposite major surface havingtin diffused therein defined as a tin side major surface; and a coatingover the air side major surface, said coating comprising aphotocatalytically-active titanium dioxide layer having a first surfaceand an opposite surface defined as a second surface with the secondsurface adjacent the air side major surface of the glass substrate andthe second surface of the coating having sodium ions diffused thereinfrom the air side major surface of the glass substrate, wherein thephotocatalytically-active titanium dioxide layer comprises a combinationof anatase phase and amorphous phase of titanium dioxide and said layerhas a thickness ranging from about 100 to about 1000 Angstroms.
 14. Aphotocatalytically active coated article comprising: a glass substratehaving an air side major surface and an opposite major surface havingtin therein defined as a tin side major surface; and a coating over theair side major surface, said coating comprising aphotocatalytically-active titanium dioxide layer having a first surfaceand an opposite surface defined as a second surface with the secondsurface adjacent the air side major surface of the glass substrate,wherein (a) the photocatalytically-active titanium dioxide layercomprises a combination of anatase phase and an amorphous phase oftitanium dioxide, (b) said layer has a thickness ranging from about 100to about 1000 Angstrom, (c) said tin side major surface has tin diffusedtherein characteristic of glass formed by pulling molten glass in theform of a glass ribbon across a molten tin bath while cooling the glassribbon, (d) said photocatalytically-active titanium dioxide layer wasdeposited by chemical vapor deposition in the tin bath and this coatedglass is exposed to ultraviolet radiation, and (e) saidphotocatalytically active titanium dioxide layer has aphotocatalytically active self-cleaning reaction rate of at least about2 ×10⁻³ cm⁻¹ min⁻¹.
 15. A coated article according to claim 14 whereinthe photocatalytically-active self-cleaning reaction rate is at leastabout 9.95×10⁻³ cm⁻¹ min⁻¹.
 16. A coated article according to claim 14,wherein the glass ribbon is at a temperature of at least about 538° C.17. A coated article according to claim 14, wherein the glass ribbon isat a temperature of at least about 600° C.
 18. A coated articleaccording to claim 14, wherein the photocatalytically-active titaniumdioxide layer is activated by exposure to ultraviolet radiation.
 19. Acoated article according to claim 14, wherein the majority of thecrystalline phase is anatase.
 20. A coated article according to claim 14wherein the second surface of the titanium dioxide layer is directly onand in contact with the air side major surface of the glass substrate.21. A coated article according to claim 14 wherein the phases of thetitanium dioxide layer optionally include rutile, and brookitecrystalline forms of titanium dioxide.
 22. A coated article according toclaim 14, further comprising a sodium ion diffusion barrier layerbetween the air side major surface of the glass substrate and thephotocatalytically-active titanium dioxide layer, wherein the barrierlayer has a thickness of at least about 100 Angstroms.
 23. A coatedarticle according to claim 22 wherein the photocatalytically-activetitanium dioxide layer has a thickness in the range of about 100 toabout 2500 Angstroms.
 24. A coated article according to claim 22,wherein the photocatalytically-active titanium dioxide layer has athickness in the range of from about 100 to about 1000 Angstroms.
 25. Acoated article according to claim 22, wherein thephotocatalytically-active titanium dioxide layer has a thickness in therange of from about 100 to about 500 Angstroms.
 26. A coated articleaccording to claim 22, wherein the photocatalytically-active titaniumdioxide layer has a thickness in the range of from about 100 to about400 Angstroms.
 27. A coated article according to claim 22, wherein thephotocatalytically-active titanium dioxide layer has a thickness in therange of from about 100 to about 200 Angstroms.
 28. A coated articleaccording to claim 22, wherein the sodium ion diffusion barrier layercomprises at least one of amorphous and crystalline phase metal oxidesselected from cobalt oxides, chromium oxides, iron oxides, tin oxides,titanium oxides, zirconium oxides, fluorine-doped tin oxides, aluminumoxides, magnesium oxides, zinc oxides, and super-oxides and sub-oxidesof any of the foregoing.
 29. A coated article according to claim 22,wherein the sodium ion diffusion barrier layer comprises at least onemetal oxide selected from magnesium oxides, aluminum oxides, zincoxides, tin oxides, and super-oxides and sub-oxides of any of theforegoing.
 30. A coated article according to claim 22, wherein thesodium ion diffusion barrier layer comprising silicon oxide and has athickness of at least about 100 Angstroms.
 31. A coated articleaccording to claim 22 wherein the glass substrate is an annealed glasssubstrate.
 32. A coated article according to claim 14 wherein thetitanium dioxide layer is formed on a float ribbon at a temperatureranging from about 538° to less than about 800° C.
 33. A coated articleaccording to claim 14, wherein the titanium dioxide layer is physicallydurable.
 34. A coated article according to claim 14, wherein thetitanium dioxide layer is resistant to chemical attack.
 35. A coatedarticle according to claim 14, wherein the photocatalytically-activetitanium dioxide layer is capable of having aphotocatalytically-activated self-cleaning reaction rate of at leastabout 5×10⁻³ cm⁻¹ min¹.
 36. A coated article according to claim 14,wherein the photocatalytically-active titanium dioxide layer is capableof having a photocatalytically-activated self-cleaning reaction rate ofat least about 7.79×10⁻³ cm⁻¹ min^('1).
 37. A coated article accordingto claim 14, wherein the photocatalytically-active titanium dioxidelayer is capable of having a photocatalytically-activated self-cleaningreaction rate of at least about 12.29×10⁻³ cm⁻¹ min⁻¹.
 38. Aphotocatalytically-activatable self-cleaning article of manufacturecomprising: a glass substrate having a first major surface and anopposite major surface defined as a second major surface, the firstmajor surface having tin diffused therein characteristic of being formedby pulling molten glass in the form of a glass ribbon across a moltentin bath while cooling the glass ribbon, and aphotocatalytically-activatable self-cleaning metal oxide coating havinga thickness of less than 1,000 Angstroms over the second major surfacecapable of having a photocatalytically-activated self-cleaning reactionrate of at least about 2×10⁻³ cm¹ min⁻¹, where the metal oxide coatingwas deposited by chemical vapor deposition at a temperature in the rangeof at least 400–800° C.
 39. The photocatalytically-activatableself-cleaning article of claim 38 wherein thephotocatalytically-activatable coating has a crystalline phasecharacteristic of chemical vapor deposition of the metal oxide over thesecond major surface in a molten tin bath where the first major surfaceis in contact with said tin bath.
 40. The photocatalytically-activatableself-cleaning article of claim 38 further comprising at least one layerinterposed between the photocatalytically-activatable self-cleaningcoating and the substrate.
 41. The photocatalytically-activatableself-cleaning article of claim 40, wherein the at least one layer has atleast one oxide chosen from crystalline metal oxides, amorphous metaloxides, crystalline silicon oxides and amorphous silicon oxides.
 42. Thephotocatalytically-activatable self-cleaning article of claim 40,wherein at least one layer is chosen from iron oxides, silver oxides,copper oxides, tungsten oxides, zinc oxides, zinc/tin oxides, strontiumtitanate, and titanium oxides chosen from anatase, rutile, and brookitecrystalline forms of titanium dioxide.
 43. Thephotocatalytically-activatable self-cleaning article of claim 38 whereinthe photocatalytically-activatable coating has an anatase titanium oxidephase characteristic of chemical vapor deposition over the second majorsurface in a molten tin bath where the first major surface is in contactwith said tin bath and wherein the article has at least one layerinterposed between the photocatalytically-activatable self-cleaningcoating and the substrate where the at least one layer comprises atleast one oxide chosen from amorphous and crystalline metal oxides, andsilicone oxides.
 44. The photocatalytically-activatable self-cleaningarticle of claim 43 wherein the metal oxides are chosen from cobaltoxides, chromium oxides, iron oxides, tin oxides, titanium oxides,zirconium oxides, fluorine-doped tin oxides, aluminum oxides, magnesiumoxides, and zinc oxides.
 45. A photocatalytically-activatable coatedglass comprising: a glass substrate having an air side major surface anda tin side major surface having been formed in a tin bath of a floatglass process; a coating over the air side major surface, said coatingcomprising a photocatalytically-activatable titanium dioxide layerhaving a first surface and a second surface with the second surfaceadjacent the air side major surface, wherein thephotocatalytically-activatable titanium dioxide layer comprises anatasetitanium dioxide and said layer has a thickness ranging from about 100to about 1000 Angstroms; and wherein the coated glass comprises aninterlayer between the photocatalytically-activatable layer secondsurface and the air side major surface of the substrate, said interlayercomprising amorphous silicon oxide.
 46. A photocatalytically-activecoated glass comprising: a glass substrate having an air side majorsurface and a tin side major surface having been formed in a tin bath ofa float glass process; a coating over the air side major surface of thesubstrate, said coating comprising a photocatalytically-active titaniumdioxide layer having a first surface and a second surface with thesecond surface adjacent the air side major surface wherein thephotocatalytically-active titanium dioxide layer comprises anatasetitanium dioxide having a thickness of less than 1000 Angstroms, and aninterlayer between the second surface of the photocatalytically-activelayer and the air side major surface of the substrate, said interlayercomprising amorphous silicon oxide, wherein said tin side major surfacehas tin diffused therein characteristic of being formed from a glassribbon floated in a molten tin bath; wherein saidphotocatalytically-active titanium dioxide layer was deposited bychemical vapor deposition in said tin bath and exposed to ultravioletradiation, and further wherein said photocatalytically-active titaniumdioxide layer has a photocatalytically-active self-cleaning reactionrate of at least about 2×10⁻³ cm⁻¹ min⁻¹.
 47. A coated glass accordingto claim 46, wherein the photocatalytically-active titanium dioxidelayer is deposited at a temperature ranging from 544° to less than about800° C. (1029° to 1472° F.).
 48. The article of claim 46 wherein thephotocatalytically-active self-cleaning reaction rate is at least about9.95×10⁻³ cm⁻¹ min¹.
 49. A photocatalytically-active coated glasscomprising: a glass substrate having an air side major surface and a tinside major surface, the tin side major surface having tin oxidecharacteristic of glass formed by pulling molten glass in the form of aglass ribbon across a molten tin bath while cooling the glass ribbon;and a coating over the air side major surface, said coating comprising aphotocatalytically-active titanium dioxide layer having a first surfaceand a second surface with the second surface adjacent the air side majorsurface, wherein said layer (a) has a thickness ranging from about 100to about 1000 Angstroms, (b) was deposited by chemical vapor depositionin said tin bath and exposed to ultraviolet radiation, and (c) has aphotocatalytically-active self-cleaning reaction rate of at least 2×10⁻³cm⁻¹ min⁻¹.
 50. A photocatalytically active coated glass comprising: aglass substrate having an air side major surface and a tin side majorsurface, the tin side major surface having tin oxide thereincharacteristic of glass formed by pulling molten glass in the form of aglass ribbon across a molten tin while cooling the glass ribbon; asodium ion diffusion barrier layer over said air side major surface, anda coating over the sodium ion diffusion barrier layer, said coatingcomprising a photocatalytically-active titanium dioxide layer having afirst surface and a second surface with the second surface adjacent thesodium ion diffusion barrier layer, wherein the photocatalyticallyactive titanium dioxide layer has a thickness ranging from about 100 toabout 1000 Angstroms, was deposited by chemical vapor deposition in saidtin bath, and has a photocatalytically active self-cleaning reactionrate of at least about 9.95×10⁻¹ cm¹ ⁻min⁻¹.
 51. The coated glass ofclaim 50 wherein the photocatalytically-active titanium dioxide layercomprises a combination of an anatase phase and an amorphous phase oftitanium dioxide.